10 results
Thickness-dependent Crystallization Behavior of Phase Change Materials
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 1072 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1072-G05-02
- Print publication:
- 2008
-
- Article
- Export citation
Crystallization Characteristics Of Phase Change Nanoparticle Arrays Fabricated By Self-Assembly Based Lithography
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 1072 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1072-G08-05
- Print publication:
- 2008
-
- Article
- Export citation
Kinetics of agglomeration of NiSi and NiSi2 phase formation.
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 745 / 2002
- Published online by Cambridge University Press:
- 11 February 2011, N4.12
- Print publication:
- 2002
-
- Article
- Export citation
Analysis Of Sige Fet Device Structures On Silicon-on-sapphire Substrates by X-Ray Diffraction
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 533 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 55
- Print publication:
- 1998
-
- Article
- Export citation
Dependence of Crystallographic Texture of C54 Tisi2 on Thickness and Linewidth In Submicron Cmos Structures
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 427 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 53
- Print publication:
- 1996
-
- Article
- Export citation
A comparison of C54-TiSi2 formation in blanket and submicron gate structures using in situ x-ray diffraction during rapid thermal annealing
-
- Journal:
- Journal of Materials Research / Volume 10 / Issue 9 / September 1995
- Published online by Cambridge University Press:
- 03 March 2011, pp. 2355-2359
- Print publication:
- September 1995
-
- Article
- Export citation
Light Scattering Measurement Of Surface Topography During Formation Of Titanium Silicide.
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 406 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 163
- Print publication:
- 1995
-
- Article
- Export citation
In Situ Analysis of the Formation of thin TISI2, (>50 nm) Contacts in Submicron Cmos Structures during Rapid Thermal Annealing
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 402 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 257
- Print publication:
- 1995
-
- Article
- Export citation
High Resolution X-ray Diffraction Measurements of Strain Relaxed SiGe/Si Structures
-
- Journal:
- Advances in X-ray Analysis / Volume 38 / 1994
- Published online by Cambridge University Press:
- 06 March 2019, pp. 181-193
- Print publication:
- 1994
-
- Article
- Export citation
High-Resolution X-Ray Diffraction Measurements of SiGe/Si Structures
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 375 / 1994
- Published online by Cambridge University Press:
- 15 February 2011, 201
- Print publication:
- 1994
-
- Article
- Export citation